| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern-forming material for forming a highly fine pattern, by effectively suppressing deterioration in sensitivity of a photosensitive layer, obtaining a high-sensitivity photosensitive layer and having superior irregularity tracing property with respect to base substance, a pattern-forming device provided with the pattern-forming material, and to provide a pattern-forming method that uses the pattern-forming material. <P>SOLUTION: In the pattern-forming material having a cushion layer and the photosensitive layer on a support, in this order, the photosensitive layer contains a fluorescent brightener as a sensitizer. When the photosensitive layer is exposed and developed, the minimum energy of light used for the exposure that does not cause the thickness of a part where the photosensitive layer is exposed to change, after the exposure and development, is 0.1-50 mJ/cm<SP>2</SP>. <P>COPYRIGHT: (C)2007,JPO&INPIT |
