| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus equipped with a processing liquid recovering mechanism which can be assembled with a simple assembling operation by eliminating the necessity of a gap adjustment of an annular discharge port in assembling. SOLUTION: The apparatus is provided with a substrate placing means for placing a processing target substrate ; a rotation driving means for rotating and driving the substrate placing means; a processing liquid supplying means for supplying a processing liquid to the surface of the processing target substrate placed on the substrate placing means; and a processing recovering means having a plurality of cups concentrically arranged so as to surround the processing target substrate placed on the substrate placing means, and used for recovering the processing liquid and an atmospheric gas which have splashed due to the rotation of the processing target substrate by the driving means, for each kind of them. In the substrate processing apparatus, the processing liquid recovering means has an opening guiding path made of a plurality of slits extending in a rotation axis direction of the substrate placing means. COPYRIGHT: (C)2007,JPO&INPIT
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