发明名称 Process monitor for laser and plasma materials processing of materials
摘要 A method for monitoring the processing of a workpiece includes directing an incident laser beam onto the workpiece and measuring a signal emitted from the workpiece. At least two signals are generated by a detector based upon the emitted signal. A workpiece processing quality is determined based upon the ratio of the two output signals and a magnitude of one of the two outputs.
申请公布号 US2007158319(A1) 申请公布日期 2007.07.12
申请号 US20070653008 申请日期 2007.01.12
申请人 HYPERTHERM, INC. 发明人 CONNALLY WILLIAM J.;WOODS KENNETH J.
分类号 B23K26/03;B23K10/00 主分类号 B23K26/03
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