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发明名称
METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE AND METHOD FOR FABRICATING FIELD EFFECT TRANSISTOR
摘要
申请公布号
KR100738766(B1)
申请公布日期
2007.07.12
申请号
KR20057009529
申请日期
2005.05.26
申请人
发明人
分类号
C23C16/42;H01L21/20;H01L21/205;H01L21/336;H01L21/338;H01L29/10;H01L29/15;H01L29/165;H01L29/778;H01L29/78;H01L29/812
主分类号
C23C16/42
代理机构
代理人
主权项
地址
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