METHOD AND APPARATUS FOR AN IMPROVED UPPER ELECTRODE PLATE WITH DEPOSITION SHIELD IN A PLASMA PROCESSING SYSTEM,申请号KR20057005442-传众专利搜索

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发明名称	METHOD AND APPARATUS FOR AN IMPROVED UPPER ELECTRODE PLATE WITH DEPOSITION SHIELD IN A PLASMA PROCESSING SYSTEM
摘要
申请公布号	KR100739247(B1)	申请公布日期	2007.07.12
申请号	KR20057005442	申请日期	2005.03.29
申请人		发明人
分类号	H01J37/32;C23C16/44	主分类号	H01J37/32
代理机构		代理人
主权项
地址

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