发明名称 ELECTRICAL DEVICE AND METHOD FOR FABRICATING THE SAME
摘要 A method of fabricating self-aligned recess utilizing asymmetric poly spacer is disclosed. A semiconductor substrate having thereon a first pad layer and second pad layer is provided. A plurality of trenches is embedded in a memory array region of the semiconductor substrate. Each of the trenches includes a trench top layer that extrudes from a main surface of the semiconductor substrate. Asymmetric poly spacer is formed on one side of the extruding trench top layer and is used, after oxidized, as a mask for forming a recess in close proximity to the trenches.
申请公布号 US2007161205(A1) 申请公布日期 2007.07.12
申请号 US20060556170 申请日期 2006.11.03
申请人 LIN SHIAN-JYH;CHENG CHIEN-LI;LEE PEI-ING;LEE CHUNG-YUAN 发明人 LIN SHIAN-JYH;CHENG CHIEN-LI;LEE PEI-ING;LEE CHUNG-YUAN
分类号 H01L21/76 主分类号 H01L21/76
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