发明名称 |
Process for fabricating an integrated circuit comprising a photodiode, and corresponding integrated circuit |
摘要 |
An integrated circuit includes at least one photodiode associated with a transfer transistor. The photodiode is formed with an upper pn junction. The transfer transistor includes a lateral spacer located on a side facing the photodiode. An upper layer of the upper pn junction includes a lateral surface extension lying beneath the spacer. A lower layer of the upper pn junction forms a source/drain region for the transfer transistor. An edge of the lateral surface extension lying beneath the spacer and adjacent a gate of the transfer transistor contacts a substrate of the integrated circuit. An oxide layer insulating the gate from the underlying substrate does not overlie the lateral surface extension of the upper layer underneath of the lateral spacer.
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申请公布号 |
US2007158712(A1) |
申请公布日期 |
2007.07.12 |
申请号 |
US20060481393 |
申请日期 |
2006.07.05 |
申请人 |
STMICROELECTRONICS S.A. |
发明人 |
LENOBLE DAMIEN;ROY FRANCOIS |
分类号 |
H01L31/113;H01L21/00 |
主分类号 |
H01L31/113 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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