发明名称 GALLIUM NITRIDE WAFER
摘要 <p>A gallium nitride wafer 11 has a substantially circular shape. The gallium nitride wafer 11 includes a plurality of stripe regions 13, a plurality of single crystal regions 15, and a visible mark 17. Each stripe region 13 represents the direction of <11-20> axis and extends in a direction of a predetermined axis. Each stripe region 13 is interposed between single crystal regions 15. The mark 17 is provided in at least one of front side 11a and back side 11b of the gallium nitride wafer 11, and has a visible size and shape. A dislocation density of the stripe regions 13 is larger than that of the single-crystal regions 15, and the crystal orientation of the stripe regions 13 is different from that of the single crystal regions 15.</p>
申请公布号 EP1806770(A1) 申请公布日期 2007.07.11
申请号 EP20060729246 申请日期 2006.03.16
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 NAKAYAMA, MASAHIRO
分类号 H01L21/02;C30B25/04;C30B29/38;H01L21/20 主分类号 H01L21/02
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