| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To reduce the overlook of a common defect in a die comparison system and a post-process due to double counting of the defect existing in a reference image after inspection and realize an efficient inspection. Ž<P>SOLUTION: In a sample inspection method using die comparison and database comparison at the same time, a comparison part 25 compares a first optical image obtained by optically imaging a first die with the reference image obtained from a design data corresponding to the die per pixel in a two-dimensional pattern mask having a plurality of repetitive regions, a multiplexer 27 combines the first optical image and the reference image for every pixel, a standard image is created and registered with an image memory 22, the comparison part 25 compares a second optical image obtained by imaging a second die with the standard image for every pixel and the defect is determined in response to a compared result of the comparison part 25. Ž<P>COPYRIGHT: (C)2004,JPO&NCIPI Ž</p> |
