| 发明名称 |
PROCESS CONTROL IN ELECTRO-CHEMICAL MECHANICAL POLISHING |
| 摘要 |
<p>Systems and methods for detecting the endpoint of a polishing step. In general, an electropolishing system is provided with a power supply configured to deliver a current through an electrolytic solution. Signal characteristics of the signal provided by the power supply are monitored to determine a polishing endpoint. Illustratively, the monitored signal characteristics include current and voltage.</p> |
| 申请公布号 |
EP1467840(B1) |
申请公布日期 |
2007.07.11 |
| 申请号 |
EP20030703929 |
申请日期 |
2003.01.21 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
DUBOUST, ALAIN;WANG, YAN;NEO, SIEW;CHEN, LIANG-YUH;MANENS, ANTOINE, P. |
| 分类号 |
B23H5/08;B24B37/013;B24B49/04;B24B49/10;C25F7/00;G01B7/06;H01L21/304;H01L21/3063;H01L21/66 |
主分类号 |
B23H5/08 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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