发明名称 Non-volatile memory
摘要 A stacked structure is formed over a substrate, and the stacked structure has a gate dielectric layer and a floating gate thereon. A first dielectric layer, a second dielectric layer and a third dielectric layer are respectively formed over the top and the sidewalls of the stacked structure and the exposed substrate. A charge storage layer covers over the top and sidewalls of the stacked structure. Also, a pair of auxiliary gates is formed over the substrate beside the charge storage layer, and a gap is between the auxiliary gates and the charge storage layer.
申请公布号 US7242052(B2) 申请公布日期 2007.07.10
申请号 US20050180080 申请日期 2005.07.11
申请人 MACRONIX INTERNATIONAL CO., LTD. 发明人 KUO MING-CHANG;WU CHAO-I
分类号 H01L29/788 主分类号 H01L29/788
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