| 摘要 |
An exhaust apparatus is provided to restrain the contamination of manufacturing equipment and a wafer due to a reverse flow of contaminants by informing a replacement cycle of a filter using an alarm unit. An exhaust apparatus includes an exhaust line, a pump, a filter, and an alarm unit. The exhaust line(120) exhausts contaminants from semiconductor manufacturing equipment. The pump(130) is installed on the exhaust line in order to exhaust the contaminant. The filter(140) is installed between the pump and the equipment on the exhaust line in order to filter off the contaminants. The alarm unit(150) is installed on the exhaust line in order to inform a replacement cycle of the filter.
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