发明名称 CHEMICAL VAPOR DEPOSITION APPARATUS FOR FLAT DISPLAY
摘要 A CVD apparatus for a flat display is provided to reduce a standby time for maintenance work of the apparatus by forcibly cooling a susceptor in a short time, thereby preventing the whole progress loss. A deposition process for a flat display(G) is carried out in a chamber(10), and a susceptor(30) is movably installed in the chamber, in which the flat display is loaded on an upper surface of the susceptor. At least one cooling block is provided on a bottom surface of the chamber, and comes in contact with the susceptor when the susceptor moves is mowed down, thereby cooling the susceptor heated at the deposition process.
申请公布号 KR100738873(B1) 申请公布日期 2007.07.06
申请号 KR20060011598 申请日期 2006.02.07
申请人 SFA ENGINEERING CORP. 发明人 KIM, NAM JIN;KIM, JOON SOO
分类号 H01L21/205 主分类号 H01L21/205
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