发明名称 |
CHEMICAL VAPOR DEPOSITION APPARATUS FOR FLAT DISPLAY |
摘要 |
A CVD apparatus for a flat display is provided to stably support a gas distribution plate in a suspending state against an electrode, without forming a spaced space therebetween. An electrode(16) is provided in a chamber in which a deposition process for a flat display is carried out. An electrode support(25) is provided on one side of the electrode to support the electrode. A gas distribution plate(17) is disposed under the electrode to distribute a deposition material on the flat display. A corrugated suspending support member(50) is connected to a surrounding portion of the gas distribution plate to support the gas distribution plate against the electrode.
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申请公布号 |
KR100738876(B1) |
申请公布日期 |
2007.07.06 |
申请号 |
KR20060016788 |
申请日期 |
2006.02.21 |
申请人 |
SFA ENGINEERING CORP. |
发明人 |
LEE, SANG MUN;KIM, NAM JIN |
分类号 |
H01L21/205;H01L21/02 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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