发明名称 CHEMICAL VAPOR DEPOSITION APPARATUS FOR FLAT DISPLAY
摘要 A CVD apparatus for a flat display is provided to stably support a gas distribution plate in a suspending state against an electrode, without forming a spaced space therebetween. An electrode(16) is provided in a chamber in which a deposition process for a flat display is carried out. An electrode support(25) is provided on one side of the electrode to support the electrode. A gas distribution plate(17) is disposed under the electrode to distribute a deposition material on the flat display. A corrugated suspending support member(50) is connected to a surrounding portion of the gas distribution plate to support the gas distribution plate against the electrode.
申请公布号 KR100738876(B1) 申请公布日期 2007.07.06
申请号 KR20060016788 申请日期 2006.02.21
申请人 SFA ENGINEERING CORP. 发明人 LEE, SANG MUN;KIM, NAM JIN
分类号 H01L21/205;H01L21/02 主分类号 H01L21/205
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