| 摘要 |
A CVD apparatus for a flat display is provided to maintain the uniformity of a deposition film by applying a high-frequency power while maintaining a lower DC bias. An electrode(16) is provided in a chamber in which a deposition process for a flat display is carried out. A susceptor(30) is movably installed in the chamber, in which the flat display is loaded on an upper surface of the susceptor. Permanent magnets(50) are engaged to the electrode to generate a magnetic field, thereby increasing plasma density in the deposition space. Plural recessed portions are formed on a surface of the electrode to receive the permanent magnets therein, and a sealing member is provided on an opened surface of the recessed portions.
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