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发明名称
Non-corrosive cleaning composition for removing plasma etching residues
摘要
申请公布号
KR100736061(B1)
申请公布日期
2007.07.06
申请号
KR20027006222
申请日期
2002.05.15
申请人
发明人
分类号
D01F6/62;C11D7/32
主分类号
D01F6/62
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代理人
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