| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of propagating ultrasonic vibration generated from an ultrasonic vibrator into a processing reservoir without attenuation, and in addition well removing particles on a substrate surface while protecting a fine pattern on the substrate surface in the processing reservoir. SOLUTION: The substrate processing apparatus 1 includes an inert gas dissolver 43 in a processing liquid supply 40, and a degassing part 53 in a propagation water supply 50. Thus, while an inert gas is dissolved into a processing liquid, propagation water for propagating the ultrasonic vibration is degassed. This prevents ultrasonic vibration energy from attenuating due to generation of bubbles in the propagation water. In addition, since the inert gas dissolved into the processing liquid serves a cushion, impact of the ultrasonic vibration is buffered in the processing reservoir 10. Therefore, the particles on the surface of a substrate W can be well removed while protecting the fine pattern on the surface of the substrate W. COPYRIGHT: (C)2007,JPO&INPIT
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