发明名称 Sensor and lithographic apparatus
摘要 A sensor for use in a lithographic apparatus, the sensor having a liquid to prevent optical losses, especially when receiving radiation with a high NA. The liquid is fixed between two surfaces by capillary forces in an area through which radiation passes.
申请公布号 US2007152178(A1) 申请公布日期 2007.07.05
申请号 US20050321466 申请日期 2005.12.30
申请人 ASML NETHERLANDS B.V. 发明人 BASTIAENSEN ROB ADRIANUS A.M.;HEMERIK MARCEL M.;VAN DE KERKHOF MARCUS A.;MARIA MERTENS JEROEN J.S.;SONNEVELD JACOB
分类号 G01N21/85 主分类号 G01N21/85
代理机构 代理人
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