发明名称 CLEANING DEVICE FOR CHARGED PARTICLE BEAM SOURCE, AND CHARGED PARTICLE BEAM DEVICE USING SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a charged particle beam device technology which stably emits charged particle beam from a high intensity charged particle beam source such as CNT (carbon nanotube), and is stable for a long period of time with high resolution. <P>SOLUTION: A surface cleaning means is provided. Thereby, for example. an amorphous contaminated film attached on a surface of the CNT is eliminated. Therefore, reaction gas introducing means 5, 6, and a gas activation means 30 are provided as the surface cleaning means to constitute a cleaner for putting an electron source 1 of such as the CNT to treat the electron source 1 before use. Alternatively, the reaction gas introducing means and the gas activation means are incorporated in an electron gun device to clean the surface in the device. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007172862(A) 申请公布日期 2007.07.05
申请号 JP20050364657 申请日期 2005.12.19
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 OSHIMA TAKU;AGEMURA TOSHIHIDE;WATANABE SHUNICHI;FUJIEDA TADASHI
分类号 H01J37/28;H01J1/304;H01J37/073 主分类号 H01J37/28
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