发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR LIGHT EMITTING ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor light emitting element useful for a semiconductor laser, a semiconductor light emitting diode or the like, wherein a p-type dopant diffusion part including an active layer is configured by a crystal having few crystal defect and having a favorable crystallinity to prevent the diffusion of the p-type dopant to the active layer. <P>SOLUTION: The semiconductor light emitting element 1 includes: an n-GaInP layer 6; an n-AlGaInP clad layer 2; a un-MQW active layer 3; a un-AlGaInP clad layer 7a; a p-AlGaInP first clad layer 7b; a p-GaInP etch stop layer 8; a p-AlGaInP second clad layer 7c; a p-GaInP intermediate layer 9; a p-GaAs cap layer 10; or the like. In the semiconductor light emitting element 1, the ratio V/III of the surface layer 2a of the layer 2, the layer 3, the layer 7a, and the layer 7b is controlled to 300, and the ratio V/III of the other AlGaInP series layer is controlled to 150. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007173620(A) 申请公布日期 2007.07.05
申请号 JP20050370753 申请日期 2005.12.22
申请人 SHARP CORP 发明人 NAKAMURA JUNICHI
分类号 H01S5/343;H01L21/205;H01L33/06;H01L33/30 主分类号 H01S5/343
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