| 摘要 |
To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength range, and a resist composition and a composition for a resist protective film, comprising the fluoropolymer. A fluoropolymer having monomer units formed by cyclopolymerization of a fluorinated diene represented by the formula (1): <?in-line-formulae description="In-line Formulae" end="lead"?>CF<SUB>2</SUB>-CFCF<SUB>2</SUB>C(CF<SUB>3</SUB>)(OR<SUP>1</SUP>)-(CH<SUB>2</SUB>)<SUB>n</SUB>CR<SUP>2</SUP>-CHR<SUP>3</SUP> (1)<?in-line-formulae description="In-line Formulae" end="tail"?> wherein R<SUP>1 </SUP>is a hydrogen atom, an alkyl group having at most 20 carbon atoms, or (CH<SUB>2</SUB>)<SUB>a</SUB>COOR<SUP>4 </SUP>(wherein a is 0 or 1, and R<SUP>4 </SUP>is a hydrogen atom or an alkyl group having at most 20 carbon atoms), each of R<SUP>2 </SUP>and R<SUP>3</SUP>, which are independent of each other, is a hydrogen atom or an alkyl group having at most 12 carbon atoms, and n is 0 or 2, provided that when n is 0, at least one of R<SUP>1</SUP>, R<SUP>2 </SUP>and R<SUP>3 </SUP>is other than a hydrogen atom.
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