Optical arrangement used in microlithography comprises photomask and adsorbing substance arranged in intermediate chamber to bind contaminating gases containing hydrocarbons by physical adsorption and/or chemical adsorption

摘要

An optical arrangement comprises a photomask (3) and an adsorbing substance arranged in an intermediate chamber (5) to bind contaminating gases containing hydrocarbons by physical adsorption and/or chemical adsorption. Independent claims are also included for the following: (1) a projection exposure arrangement (10) for microlithography containing the above optical arrangement; and (2) operating a projection exposure arrangement. Preferred Features: The adsorbing substance contains a zeolite, a metal or metal oxide or an activated charcoal impregnated with basic or acidic materials. A separating wall or membrane is arranged between the adsorbing substance and the intermediate chamber.