摘要 |
<p>A polymer for imparting repellency and stain resistance to substrates is disclosed of Formula (1): (W)<SUB>a</SUB>(R<SUP>2</SUP>)<SUB>b</SUB>-Si(R<SUP>1</SUP>)<SUB>2</SUB>-O-[Si(R<SUP>1</SUP>)<SUB>2</SUB>-O]<SUB>n</SUB>-[Si(W)<SUB>c</SUB>(R<SUP>1</SUP>)<SUB>d</SUB>(R<SUP>2</SUP>)<SUB>e</SUB>-O]<SUB>m</SUB>-Si(R<SUP>1</SUP>)<SUB>2</SUB>-(W)<SUB>f</SUB>(R<SUP>2</SUP>)<SUB>g</SUB> wherein: a, b, c, d, e, f and g are each independently 0 or 1, provided that (a + b) is 1, (f + g) is 1, and (c + d + e) is 2, each R<SUP>1</SUP> is divalently a C<SUB>1</SUB> to C<SUB>8</SUB> alkyl, each R<SUP>2</SUP> is independently H or C<SUB>1</SUB> to C<SUB>8</SUB> alkyl, optionally containing oxygen, nitrogen, or sulfur, or a combination thereof, n = 0 to 500, m = 1 to 100, each W is independently (R<SUB>f</SUB>-X-A-X)<SUB>p</SUB>-Y wherein: R<SUB>f</SUB> is a straight or branched perfluoroalkyl group having from about 2 to about 20 carbon atoms, or a mixture thereof, which is optionally interrupted by at least one oxygen atom, each X is independently an organic divalent linking group having from about 1 to about 20 carbon atoms, optionally containing oxygen, nitrogen, or sulfur, or a combination thereof, A is a 1, 2, 3-triazole, p = 0 to 2, and Y is O, OR, N, NR or N(R)<SUB>2 </SUB>wherein R is H or C<SUB>1</SUB> to C<SUB>20</SUB> alkyl, optionally containing oxygen, nitrogen, or sulfur, or a combination thereof.</p> |
申请人 |
E. I. DU PONT DE NEMOURS AND COMPANY;ACOSTA, ERICK, JOSE;HERZOG, AXEL, HANS-JOACHIM;PABON, MARTIAL, JEAN-JACQUES |
发明人 |
ACOSTA, ERICK, JOSE;HERZOG, AXEL, HANS-JOACHIM;PABON, MARTIAL, JEAN-JACQUES |