METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND ELECTRONIC EQUIPMENT USING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device which can obtain a reflection type liquid crystal display device having a pixel structure capable of realizing high aperture ratio without increasing the number of masks and the number of steps. SOLUTION: The method of manufacturing the semiconductor device has steps of forming a semiconductor layer on a substrate, forming a gate insulation film on the semiconductor layer, and forming a source wiring on the gate insulation film. The source wiring is formed by etching a conductive film using a induction coupling type plasma, and the source wiring has a tapered shape. The semiconductor layer is made of a crystalline semiconductor film. The etching is executed using a mixed gas of CF4and Cl2. The method has a process of forming an interlayer insulation film on the source wiring. COPYRIGHT: (C)2007,JPO&INPIT