| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a contact exposure device which has high contactness between a photomask and a substrate. <P>SOLUTION: A frame 3 is mounted on an outer periphery of the substrate 2 and suctionally fixed through a suction hole 56. The contactness between the photomask and substrate is improved by the frame 3. The frame 3 is an integrated type, so the fixation is secured by the suction, attachment and detachment are facilitated, and automation is facilitated. A flow groove 30 is formed on the backside of the frame 3 to suck a gap 35 formed between the frame 30 and substrate 2, and the photomask 1 and substrate 2 are securely brought into contact with each other. <P>COPYRIGHT: (C)2007,JPO&INPIT |
