发明名称 METHOD OF MANUFACTURING IC BUILT-IN SUBSTRATE
摘要 <p><P>PROBLEM TO BE SOLVED: To cope with an increase in the number of pad electrodes or fine pitch without damaging semiconductor IC chips built in a resin layer by heat or application of load (stress). <P>SOLUTION: First, copper foils 12 provided on both surfaces of a core substrate 11 are selectively removed by photolithography and etching, thus forming a conductive pattern 13 such as wiring or land, on the core substrate 11. Next, a semiconductor IC chip 14 is mounted face-up in a specified area on the core substrate 11, and then it is buried in a resin sheet 16. A copper foil 17 formed on the surface of the resin sheet 16 is selectively removed by conformal treatment, thus forming a mask pattern for forming a via hole. Then, the copper foil 17 applied with the conformal treatment is used as a mask, and sand-blasting is conducted to form a via hole 19. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007173276(A) 申请公布日期 2007.07.05
申请号 JP20050364458 申请日期 2005.12.19
申请人 TDK CORP 发明人 NAGASE KENJI;KAWABATA KENICHI
分类号 H05K3/46;H05K3/26 主分类号 H05K3/46
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