| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist protective film which ensures high transparency and insensitivity in a wide wavelength region, excels in suppression of PED effect, is soluble in an alkali developer, can be removed at a developing step of the existing resist process, and has high water repellency. <P>SOLUTION: The resist protective film contains a silicon-containing polymer (A) having C-F and C-Si bonds. The silicon-containing polymer (A) is preferably a polymer obtained by copolymerizing a monomer having a C-F bond and a monomer having a C-Si bond. The monomer having a C-Si bond is preferably a monomer represented by CH<SB>2</SB>=CR<SP>4</SP>-COO-X-Si(R<SP>1</SP>R<SP>2</SP>R<SP>3</SP>), wherein R<SP>1</SP>-R<SP>3</SP>are each a 1-6C alkyl group which may have an etheric oxygen atom and/or an Si atom; R<SP>4</SP>is a hydrogen atom or a methyl group; and X is a single bond or a 1-8C divalent organic group. <P>COPYRIGHT: (C)2007,JPO&INPIT |
