发明名称 Plasma processing system
摘要 A high-frequency measurement unit includes a signal detector for detecting a high-frequency signal, and a calibration coefficient storage for storing calibration coefficients Cmin and Cmax used to calibrate a value Amin detected at the lowest limit frequency fmin and a value Amax detected at the uppermost limit frequency fmax to a proper measurement value Asmin and to a proper measurement value Asmax, respectively. The high-frequency measurement unit further includes a frequency detection unit for detecting a frequency fm of the high-frequency signal, a calibration coefficient calculation unit for calculating a calibration coefficient Cm for the frequency fm, and a calibration unit for calibrating the value Am detected by the signal detector to a proper measurement value Asm by using the calibration coefficient Cm calculated by the calibration coefficient calculation unit.
申请公布号 US2007152678(A1) 申请公布日期 2007.07.05
申请号 US20060636389 申请日期 2006.12.08
申请人 DAIHEN CORPORATION 发明人 MATOBA HIROSHI;TANAKA RYOHEI;OMAE SHUJI;AMADATSU SHIGEKI
分类号 G01R35/00 主分类号 G01R35/00
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