发明名称 ELECTROSTATIC CHUCK
摘要 PROBLEM TO BE SOLVED: To provide a bipolar electrostatic chuck that can evenly fix a wafer onto an absorbing surface. SOLUTION: An electrostatic chuck 1 includes, on a ceramic substrate 2, a ceramic dielectric layer 6 that has an absorbing surface 3 made from a non-retaining material W, a first absorption electrode 4a on which positive voltage is applied, and a second absorption electrode 4b on which negative voltage is applied. The ceramic dielectric layer 6 is made from aluminum nitride with purity equal to 98% by weight or more. The main component of the absorption electrodes 4a and 4b is Mo, W, Ti, an alloy thereof, or at least one kind of sintered compact among TiN, WC, and TiC. A thickness Tb of the ceramic dielectric layer 6 between the adsorbing surface 3 and the second absorption electrode 4b is thicker than a thickness Ta of the ceramic dielectric layer 6 between the absorbing surface 3 and the first absorption electrode 4a. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007173592(A) 申请公布日期 2007.07.05
申请号 JP20050370338 申请日期 2005.12.22
申请人 KYOCERA CORP 发明人 ITONAGA NAOKO
分类号 H01L21/683;H02N13/00 主分类号 H01L21/683
代理机构 代理人
主权项
地址