| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus which traps a substance produced by bumping, and stably forms a film having a sufficient thickness, and to provide a method therefor. SOLUTION: The vapor deposition apparatus 1 is directed at heating a vapor deposition material 5 to vaporize it and vapor-depositing the vapor deposition material 5 onto a substrate 3, and comprises: a vapor deposition boat 6 having a main body 11 for accommodating the vapor deposition material 5 and a trapping member 12 which is arranged over the vapor deposition material 5 and traps the substance produced by the bumping of the vapor deposition material 5; and a heating means 7 for heating the vapor deposition boat 6. The vapor deposition apparatus 1 is also structured such that a temperature of the trapping member 12 can be higher than that of the vapor deposition material 5 in a vapor deposition operation. COPYRIGHT: (C)2007,JPO&INPIT
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