| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and device for preventing contamination of a projection system. <P>SOLUTION: The lithography device comprises a projection system PS so configured as to project first radiation beam at a target portion of a substrate, and at least one monitor devices 10, 110, 210, 310, 410, and 510 for detecting contamination in the internal space. The monitor devices 10, 110, 210, 310, 410, and 510, comprise at least one dummy element having at least one contamination receiving surface. At least one such dummy element is provided as is not related to transfer of radiation beam to the target portion of the substrate, and whether the contamination receiving surface of the dummy element is contaminated or not is monitored. <P>COPYRIGHT: (C)2007,JPO&INPIT |
