| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of keeping a time, which is required for cleaning a substrate after a film forming process is finished, constant, uniformly cleaning the substrate, and transferring the substrate subjected to a film forming process as keeping it clean. SOLUTION: The substrate processing apparatus is equipped with a substrate cleaning device 1 for cleaning the substrate subjected to a film forming process through a CVD processing device 12 provided with a processing unit. Furthermore, the substrate processing apparatus is equipped with: cleaning units 6 and 7 for cleaning the surface of the substrate, a reversing/cleaning unit 8 for cleaning the rear of the substrate; an indexer unit 75 provided with a loading/unloading table 73 where a substrate transfer cassette 12 is mounted; the processing unit of the CVD processing device 12; and substrate transfer mechanisms 4 and 74 for transferring the substrates from the cleaning units 6 and 7 and the second cleaning unit 8 to the indexer unit 75. COPYRIGHT: (C)2007,JPO&INPIT
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