发明名称 |
MANUFACTURING METHODS OF NOZZLE SUBSTRATE, LIQUID DROPLET DISCHARGE HEAD, LIQUID DROPLET DISCHARGE APPARATUS, AND DEVICE MANUFACTURING PROCESS OF DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a nozzle substrate which enables the manufacture of the nozzle substrate in an improved yield and productivity by machining a silicone base material without its breakage, and also to provide a manufacturing method of a liquid droplet discharge head, and the like. SOLUTION: The manufacturing method of the nozzle substrate 1 includes steps of: forming nozzle holes 11 in a silicone base material 100 by etching; bonding a supporting substrate 120 on the large-diameter hole 11b side surface 100a of the silicone base material 100; forming a laminated surface 100b on the small diameter hole 11a side of the silicone base material 100 and making an opening at the top of the small hole 11a; applying ink repellent treatment to the surface 100b on the small diameter hole 11a side of the silicone base material 100; and separating the supporting substrate 120 from the silicone base material 100. The large diameter hole 11b side surface 100a of the silicone base material 100 and the supporting substrate 120 are bonded with each other via a double-sided adhesive sheet 50. The manufacturing method of the nozzle substrate 1 is also applied to manufacture of the liquid droplet discharge head. COPYRIGHT: (C)2007,JPO&INPIT
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申请公布号 |
JP2007168344(A) |
申请公布日期 |
2007.07.05 |
申请号 |
JP20050371349 |
申请日期 |
2005.12.26 |
申请人 |
SEIKO EPSON CORP |
发明人 |
BIZEN RYOICHI;ARAKAWA KATSUHARU |
分类号 |
B41J2/135 |
主分类号 |
B41J2/135 |
代理机构 |
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