ELECTRONIC DEVICE INCLUDING A TRANSISTOR STRUCTURE HAVING AN ACTIVE REGION ADJACENT TO A STRESSOR LAYER AND A PROCESS FOR FORMING THE ELECTRONIC DEVICE

摘要

An electronic device (10) can include a transistor structure (50) of a first conductivity type, a field isolation region (22), and a layer (130) of a first stress type overlying the field isolation region. For example, the transistor structure (50) may be a p-channel transistor structure (50) and the first stress type may be tensile, or the transistor structure (60) may be an n- channel transistor structure and the first stress type (70) may be compressive. The transistor structure (50) can include a channel region (54) that lies within an active region. An edge of the active region includes the interface between the channel region (54) and the field isolation region (22). From a top view, the layer can include an edge that lies near the edge of the active region. The positional relationship between the edges can affect carrier mobility within the channel region (54) of the transistor structure (50).