| 摘要 |
Equipment for manufacturing a semiconductor device is provided to restrain the generation of particles in a reaction gas by using a gas supply line capable of filtering simultaneously the particles. Equipment for manufacturing a semiconductor device includes a process chamber(110) for performing a predetermined process on a wafer, a gas supply unit and a gas supply line. The gas supply unit(120) is connected with the process chamber in order to supply a reaction gas into the process chamber. The gas supply line(125) is connected to the gas supply unit. The gas supply line is used for supplying the reaction gas into the process chamber and filtering simultaneously particles. The gas supply line includes a filter unit.
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