发明名称 METHOD OF FORMING SPACERS AND ALIGNMENT PROTRUSIONS SIMULTANEOUSLY
摘要 A method for simultaneously forming a spacer and an alignment protrusion is provided to reduce the manufacturing cost of a substrate and the number of manufacturing processes. A substrate(200) is prepared and a light shielding layer(205) is formed on the substrate. Thereafter, the contour of plural sub pixel areas is defined. Plural color filters are formed at the sub pixel areas. A transparent electrode layer(220) is formed on the light shielding layer and the color filter. A transparent photo resist layer is formed on the transparent electrode layer. Plural spacers and alignment protrusions of the transparent photo resist layer are simultaneously patterned by means of a half-tone mask at the lithography process. The light shielding layer is constructed by chromium or black photosensitive resin. The thickness of the black photosensitive resin is about 1 to 2 micrometer.
申请公布号 KR20070072323(A) 申请公布日期 2007.07.04
申请号 KR20060045155 申请日期 2006.05.19
申请人 AU OPTRONICS CORP. 发明人 HUANG TIEN CHUN;SHIH MING HUNG
分类号 G02F1/1339 主分类号 G02F1/1339
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