APPARATUS OF CLEANING A STAGE

摘要

A stage cleaning apparatus is provided to remove particles from a surface of a stage using a cleaning disc, without disassembling the stage, thereby shortening a process time. A cleaning disc(12) is provided on one side of a stage(10) supporting a semiconductor wafer to push particles attached on a surface of the stage away from the surface. A vacuum holding part(14) holds the cleaning disc using vacuum. When the particles are removed from the surface of the stage by using the cleaning disc, the vacuum holding part holding the stage and/or the cleaning disc is moved. A vacuum applying part is provided on the stage to apply vacuum from the surface of the stage to a rear side of the stage.