| 摘要 |
An overlay aligning method using rotation of a stage of semiconductor measuring equipment is provided to quickly and accurately drive a stage by simultaneously rotating the wafer around X-axis, Y-axis and rad-axis. An overlay measuring apparatus forms an overlay measuring pattern to seize and correct an aligning state between a layer formed at a previous step and a layer formed at a current step. A stage(10) is rotated around an X-axis and a Y-axis, and the stage is rotated around a rad-axis, based on an automatic TIS(Tool Induced Shift) function of a semiconductor measuring equipment. A CCD(Charged Couple Device) camera is rotated at the same angle to normally display an image.
|
