| 摘要 |
<p>A high current density plasma generator includes a chamber (104) that contains a feed gas. An anode (124) is positioned in the chamber. A cathode assembly (116) is position adjacent to the anode inside the chamber. A power supply (102) having an output is electrically connected between the anode and the cathode assembly. The power supply generates at the output an oscillating voltage that produces a plasma from the feed gas. At least one of an amplitude, frequency, rise time, and fall time of the oscillatory voltage is chosen to increase an ionization rate of the feed gas (108).</p> |
