| 摘要 |
A lithography apparatus and a device manufacturing method are provided to enhance the exactness of a relative position between a substrate and a projection system. A lithography apparatus includes a substrate table(WT) for supporting a substrate(W), a projection system, a liquid supply system, a cover plate, and a substrate table temperature stabilizing device. The projection system(PL) projects a modulated radiation beam onto the substrate. The liquid supply system supplies a predetermined liquid to a portion between the projection system and the substrate. The cover plate is located at an outer side of the substrate in an exposure process. The cover plate is located at a portion substantially adjacent to the substrate. The cover plate is physically separated from the substrate table. The substrate table temperature stabilizing device controls partially the temperature of the cover plate. |
