发明名称 |
PRAM COMPRISING DOPED PHASE CHANGE LAYER AND METHOD OF OPERATING THE SAME |
摘要 |
<p>A phase change memory device having a doped phase change layer and its driving method are provided to reduce reset current, lower a melting point, and increase resistance of the device. A gate insulation layer(42) and a gate electrode(44) are formed on a substrate(40), and then a first interlayer dielectric(46) is formed on the substrate. A contact hole Is formed in the first interlayer dielectric, and the contact hole is filled with a conductive plug(50). A lower electrode(60) is formed on the first interlayer dielectric, and a second interlayer dielectric(62) is formed on the first interlayer dielectric. A phase change layer(66) doped with indium is formed on the second interlayer dielectric to cover an exposed surface of a lower electrode contact layer(64).</p> |
申请公布号 |
KR100738115(B1) |
申请公布日期 |
2007.07.04 |
申请号 |
KR20060062409 |
申请日期 |
2006.07.04 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
NOH, JIN SEO;KIM, KI JOON;KHANG, YOON HO;SHIN, WOONG CHUL;SUH, DONG SEOK |
分类号 |
H01L27/115;H01L21/8247 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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