发明名称 PRAM COMPRISING DOPED PHASE CHANGE LAYER AND METHOD OF OPERATING THE SAME
摘要 <p>A phase change memory device having a doped phase change layer and its driving method are provided to reduce reset current, lower a melting point, and increase resistance of the device. A gate insulation layer(42) and a gate electrode(44) are formed on a substrate(40), and then a first interlayer dielectric(46) is formed on the substrate. A contact hole Is formed in the first interlayer dielectric, and the contact hole is filled with a conductive plug(50). A lower electrode(60) is formed on the first interlayer dielectric, and a second interlayer dielectric(62) is formed on the first interlayer dielectric. A phase change layer(66) doped with indium is formed on the second interlayer dielectric to cover an exposed surface of a lower electrode contact layer(64).</p>
申请公布号 KR100738115(B1) 申请公布日期 2007.07.04
申请号 KR20060062409 申请日期 2006.07.04
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 NOH, JIN SEO;KIM, KI JOON;KHANG, YOON HO;SHIN, WOONG CHUL;SUH, DONG SEOK
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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