| 摘要 |
A detecting method using an alignment key detecting apparatus is provided to prevent the generation of alignment key fail and to reduce a processing time by increasing a detection range. A focusing process is performed on a predetermined portion of a substrate(20) by using a microscope(13). An evaluation value of focusing is quantified and the evaluation value is used as an allowance for detecting an alignment key(20a) of the substrate. The alignment key is automatically detected by the allowance obtained from the evaluation value. A first center of a screen of the microscope, a second center of the alignment key of the substrate, and a third center of a mask alignment key are tuned with each other under the focusing process.
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