| 摘要 |
An alignment key of a semiconductor device is provided to perform easily an analyzing process and to perform simultaneously an aligning process by forming a line pattern using a plurality of divided fine line patterns. An alignment key includes line/space patterns. The alignment key is formed within a scribe lane. The line pattern of the alignment key includes a plurality of divided fine patterns(200) for the measurement of CD(Critical Dimension). The line pattern is composed of a bar type pattern, first divided fine patterns, and first fine spaced patterns between the first divided fine patterns. The first divided fine pattern is composed of second divided fine patterns(300) and second fine space patterns(310) between the second divided fine patterns.
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