| 摘要 |
A vacuum drying apparatus for the fabrication of a liquid crystal display device is provided to minimize the generation of failure by enhancing the uniformity of volatility of solvent on the entire surface of a substrate regardless of the size of the substrate using lower and upper exhaust lines capable of exhausting simultaneously the solvent and air from upper and lower portions of a chamber. A vacuum drying apparatus for the fabrication of a liquid crystal display device includes a chamber, a supporter mounted in the chamber to receive a substrate, a lower exhaust line(13) connected through a lower portion of the chamber, a vacuum line, an upper exhaust line, and a depressurizing unit. The vacuum line is formed along an inner surface of the chamber. The vacuum line is connected through the lower exhaust line. The upper exhaust line(23) is used for connecting an upper inner space of the chamber and the vacuum line with each other. The depressurizing unit is used for generating the suction through the lower exhaust line.
|
