发明名称 Ferroelectric memory device
摘要 A ferroelectric memory device has a high performance, includes no Pb, and can be directly mounted onto an Si substrate. The ferroelectric memory device includes a (001)-oriented BiFeO<SUB>3 </SUB>ferroelectric layer 5 with a tetragonal structure, which is formed on an electrode 4 made of a perovskite material formed on an Si oxide film. The electrode 4 with a perovskite structure is formed by an ion beam assist method.
申请公布号 US7238978(B2) 申请公布日期 2007.07.03
申请号 US20040867812 申请日期 2004.06.16
申请人 SEIKO EPSON CORPORATION 发明人 MIYAZAWA HIROMU;HIGUCHI TAKAMITSU;IWASHITA SETSUYA
分类号 C23C14/08;H01L29/82;C23C14/22;H01L21/316;H01L21/8246;H01L27/105;H01L27/115;H01L31/109 主分类号 C23C14/08
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