| 摘要 |
An exposure apparatus includes a beam splitter for splitting light from a light source into first and second beams, a spatial light modulator, arranged in an optical path for the first beam, for modulating a phase distribution of the first beam, a beam coupler for coupling the first beam with the second beam, a projection optical system for projecting a pattern of the spatial light modulator onto a substrate using light from the beam coupler, and a controller for supplying a modulation signal to the spatial light modulator, wherein the spatial light modulator has a one-dimensionally or two-dimensionally arranged pixels, each pixel has plural reflective elements, and the reflective elements in the same pixel displace in the same direction simultaneously.
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