| 摘要 |
Provided is a silicon release coating film with an anti-static function capable of reducing contamination in a product such as a semiconductor, or electrical and electronics display, which is caused by an electrostatic phenomenon during the separation from an adhesive. The silicon release coating film is comprised of a polyester film in thickness of 5-300 micrometers, an anti-static layer formed by coating at least one surface of the polyester film with a siloxane based anti-static composition, and a silicon release layer applied on the anti-static layer. The siloxane based anti-static composition contains organo polyalkoxy siloxane. The silicon release layer contains a silicon release composition including organo polysiloxane, organo hydrogen polysiloxane, and platinum chelate catalyst. |
