| 摘要 |
A method for manufacturing an array substrate of an LCD(Liquid Crystal Display) is provided to prevent an under-cut according to dry etching from being generated at the contact of a gate insulating layer and a semiconductor layer, thereby restraining the generation of cut between a pixel electrode and a drain electrode. A gate electrode(115) is formed on a substrate(110). A gate insulating layer(120) is formed on the gate electrode. An amorphous silicon layer, an impurity-doped amorphous silicon layer, and a metal layer are sequentially formed on the gate insulating layer. A first photoresist pattern(190a) having a first thickness and a second photoresist pattern having a second thickness thinner than the first thickness are formed on the metal layer. The metal layer, the impurity-doped amorphous silicon layer, and the amorphous silicon layer are etched using the first and second photoresist patterns as a mask to form an active layer(122), an impurity-doped amorphous silicon pattern(126), and a metal pattern. The second photoresist pattern is removed to expose a predetermined portion of the metal pattern. The exposed metal pattern and the impurity-doped amorphous silicon pattern are etched to form source and drain electrodes(133,136) and, simultaneously, a predetermined portion of the active layer is exposed. A passivation layer having a drain contact hole is formed on the source and drain electrodes and the active layer. A pixel electrode connected to the drain electrode through the drain contact hole is formed on the passivation layer. |
