发明名称 APPARATUS AND METHOD FOR FORMING ALIGN MARK
摘要 An apparatus and a method for forming an alignment mark are provided to directly and simply form an alignment mark onto a metal layer without additional etching process by using an AFM(Atomic Force Microscopy) lithography process. A metal layer(122) is formed on a substrate(120). The substrate is fixed onto a stage(100). A probe tip(134) is in contact with the metal layer. Two different voltages are applied to the stage and the probe tip. The probe tip is caused to be in contact with the metal layer, so that an alignment mark(170) of an emboss pattern is formed depending on a voltage difference between the probe tip and the metal layer. The voltage difference allows the metal layer to be changed to be a metal oxide layer, so that the alignment mark is formed with a convex shape from the metal layer.
申请公布号 KR20070069462(A) 申请公布日期 2007.07.03
申请号 KR20050131658 申请日期 2005.12.28
申请人 LG.PHILIPS LCD CO., LTD. 发明人 KIM, JEONG OH;JEE, YOUNG SEUNG;KANG, SU HYUK
分类号 H01L21/027 主分类号 H01L21/027
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