| 摘要 |
A control apparatus against a chemical over-dip in a cleaning process is provided to prevent the generation of loss on a wafer due to hardware trouble. A circulation line(4) in a chemical bath(1) is started from an outer bath(3), sequentially passed through a pump(P), an in-line heater(H), and a filter(F), and ended to an inner bath(2). The circulating line is used for circulating predetermined chemicals. The circulation of the predetermined chemicals through the circulation line is kept until the lifetime of the predetermined chemicals is ended. Then, the predetermined chemicals are exhausted from the chemical bath through a drain line. The exhausted chemicals are drained from an aspirator(A) through an aspirator drain valve(8).
|
